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Cathodic arc deposition : ウィキペディア英語版
Cathodic arc deposition
Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
==History==
Industrial use of modern cathodic arc deposition technology originated in Soviet Union around 1960–1970.
By the late 70's Soviet government released the use of this technology to the West.
Among many designs in USSR at that time the design by L. P. Sablev, et al., was allowed to be used outside the USSR.

抄文引用元・出典: フリー百科事典『 ウィキペディア(Wikipedia)
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